[D-10-3] Highly Oriented ZnO Films Prepared by MOCVD from Diethylzinc and Alcohols

S. Oda, H. Tokunaga, N. Kitajima, J. Hanna, I. Shimizu, H. Kokado (1.Imaging Sci. & Eng. Lab., Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.1984.D-10-3