Structural Characterization of Very Thin Films by Fluorescence-Detected X-Ray Absorption Spectroscopy

H. Oyanagi; H. Tanoue; T. Ishiguro; T. Matsushita; K. Kohra

doi:https://doi.org/10.7567/SSDM.1984.LD-1-5

1984 International Conference on Solid State Devices and Materials

Aug 30, 1984 - Sep 1, 1984
International Conference Center Kobe, Kobe, Japan

[LD-1-5] Structural Characterization of Very Thin Films by Fluorescence-Detected X-Ray Absorption Spectroscopy

H. Oyanagi, H. Tanoue, T. Ishiguro, T. Matsushita, K. Kohra (1.Electrotechnical Laboratory, 2.Photon Factory, National Laboratory for High Energy Physics)

https://doi.org/10.7567/SSDM.1984.LD-1-5

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