[LD-7-1] XeCl EXCIMER LASER OXIDATION OF Si EMPLOYING O2/Cl2 GAS MIXTURE

Keiji HORIOKA、Haruo OKANO、Yasuhiro HORIIKE (1.Toshiba VLSI Research Center, Toshiba Corp.)

https://doi.org/10.7567/SSDM.1984.LD-7-1