Computer Controlled Direct Pattern Writing by Argon Laser Induced Chemical Vapor Deposition

Akira Ishizu; Hidejiro Miki; Yoichiro Onishi Tadashi Nishimura; Yoichi Akasaka

doi:https://doi.org/10.7567/SSDM.1984.LD-7-2

1984 International Conference on Solid State Devices and Materials

Aug 30, 1984 - Sep 1, 1984
International Conference Center Kobe, Kobe, Japan

[LD-7-2] Computer Controlled Direct Pattern Writing by Argon Laser Induced Chemical Vapor Deposition

Akira Ishizu, Hidejiro Miki, Yoichiro Onishi Tadashi Nishimura, Yoichi Akasaka (1.Materials & Electronic Devices Lab., Mitsubishi Electric, 2.LSI Research & Development Lab., Mitsubishi Electric)

https://doi.org/10.7567/SSDM.1984.LD-7-2

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