[A-2-2] Amplitude Modulated Pseudo-Line Electron Beam Recrystallization for Large Area SOI Growth

T. Hamasaki、T. Inoue、I. Higashinakagawa、T. Yoshii、M. Kashiwagi、H. Tango (1.VLSI Research Center, Toshiba Corporation)

https://doi.org/10.7567/SSDM.1985.A-2-2