Homogeneous Recrystallization of Si Islands through Wafer by Dual Laser Beam lrradiation

K. YAMAZAKI; N. YOSHII; S. OGAWA; S. AKIYAMA; Y. TERUI

doi:https://doi.org/10.7567/SSDM.1985.A-2-7

[A-2-7] Homogeneous Recrystallization of Si Islands through Wafer by Dual Laser Beam lrradiation

K. YAMAZAKI、N. YOSHII、S. OGAWA、S. AKIYAMA、Y. TERUI (1.Advanced Devices Laboratory, Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.)

https://doi.org/10.7567/SSDM.1985.A-2-7

1985 Conference on Solid State Devices and Materials

[A-2-7] Homogeneous Recrystallization of Si Islands through Wafer by Dual Laser Beam lrradiation