SiO2 Photo-CVD Using Reactive Oxygen by Double Light Excitation

Masanori OKUYAMA; Kohji INOUE; Masanori MICHIMORI; Yoshihiro HAMAKAWA

doi:https://doi.org/10.7567/SSDM.1985.A-3-7

1985 Conference on Solid State Devices and Materials

1985年8月25日〜 1985年8月27日
Nippon Toshi Center, Tokyo, Japan

[A-3-7] SiO2 Photo-CVD Using Reactive Oxygen by Double Light Excitation

Masanori OKUYAMA、Kohji INOUE、Masanori MICHIMORI、Yoshihiro HAMAKAWA (1.Department of Electrical Engineering, Faculty of Engineering Science, Osaka University)

https://doi.org/10.7567/SSDM.1985.A-3-7

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