[A-4-4] Refractory-Metal-Silicide Contact Formation by Rapid Thermal Annealing

Nobuyoshi NATSUAKI、Kiyonori OHYU、Tadashi SUZUKI、Nobuyoshi KOBAYASHI、Naotaka HASHIMOTO、Yasuo WADA (1.Central Research Laboratory, Hitachi Ltd.)

https://doi.org/10.7567/SSDM.1985.A-4-4