[A-5-3] Proximity Effect Correction for 1/4 μm Pattern Formation in Electron Beam Lithography

T. Takigawa, E. Nishimura, S. Tamamushi, Y. Katoh (1.VLSI Research Center, Toshiba R & D Center, Toshiba Corporation)

https://doi.org/10.7567/SSDM.1985.A-5-3