[A-5-6] Characterization of a Newly Developed Contrast Enhancement Material for G-Line Exposure

H. Niki, M. Nakase, A. Kumagae, T. Satoh, K. Ikari (1.Toshiba Research & Development Center, 2.VLSI Research Center Toshiba Corporation)

https://doi.org/10.7567/SSDM.1985.A-5-6