[A-5-9LN] EVALUATION OF NEW NEGATIVE PHOTORESIST, LMR-UV, BY G-LINE WAFER STEPPERS

Y. YAMASHITA、R. KAWAZU、T. ITOH、K. KAWAMURA、S. OHNO、T. ASANO、K. KOBAYASHI、AND G. NAGAMATSU (1.Research Laboratory, Oki Electric Industry Co., Ltd.、2.Fuji Chemicals Industrial Co., Ltd.)

https://doi.org/10.7567/SSDM.1985.A-5-9LN