[C-2-3] Low Temperature SiO2 Film Formation by Microwaｖe Plasma Assisted Reactive Beam Deposition

Eiichi Murakami、Shin-ichiro Kimura、Terunori Warabisako、Kiyoshi Miyake、Hideo Sunami (1.Central Research Laboratory, Hitachi Ltd.)

https://doi.org/10.7567/SSDM.1985.C-2-3