[C-2-3] Low Temperature SiO2 Film Formation by Microwaｖe Plasma Assisted Reactive Beam Deposition

Eiichi Murakami, Shin-ichiro Kimura, Terunori Warabisako, Kiyoshi Miyake, Hideo Sunami (1.Central Research Laboratory, Hitachi Ltd.)

https://doi.org/10.7567/SSDM.1985.C-2-3