Leakage-Current Reduction in Thin Ta2O5 Films Using High Purity Ta Target

Chisato Hashimoto Hideo Oikawa; Nakahachiro Honma

doi:https://doi.org/10.7567/SSDM.1985.C-2-4

1985 Conference on Solid State Devices and Materials

1985年8月25日〜 1985年8月27日
Nippon Toshi Center, Tokyo, Japan

[C-2-4] Leakage-Current Reduction in Thin Ta2O5 Films Using High Purity Ta Target

Chisato Hashimoto Hideo Oikawa、Nakahachiro Honma (1.NTT Atsugi Electrical Communication Laboratories、2.NTT Musashino Electrical Communication Laboratories)

https://doi.org/10.7567/SSDM.1985.C-2-4

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