Leakage-Current Reduction in Thin Ta2O5 Films Using High Purity Ta Target

Chisato Hashimoto Hideo Oikawa; Nakahachiro Honma

doi:https://doi.org/10.7567/SSDM.1985.C-2-4

[C-2-4] Leakage-Current Reduction in Thin Ta2O5 Films Using High Purity Ta Target

Chisato Hashimoto Hideo Oikawa, Nakahachiro Honma (1.NTT Atsugi Electrical Communication Laboratories, 2.NTT Musashino Electrical Communication Laboratories)

https://doi.org/10.7567/SSDM.1985.C-2-4

1985 Conference on Solid State Devices and Materials

[C-2-4] Leakage-Current Reduction in Thin Ta2O5 Films Using High Purity Ta Target