[C-2-6] Optical and Electrical Properties of Amorphous Silicon Nitride Films Prepared at High Deposition Rate

Y. Nishibayashi, T. Yamamoto, T. Imura, Y. Osaka, K. Shizuma, F. Nishiyama (1.Department of Electrical Engineering, Hiroshima University)

https://doi.org/10.7567/SSDM.1985.C-2-6