[A-10-2] Magnetron-Plasma CVD System and Its Application to Aluminum Film Deposition

Takashi Kato、Takashi Ito、Hajime Ishikawa、Mamoru Maeda (1.FUJITSU LABORATORIES LTD., ATSUGI、2.FUJITSU LIMITED)

https://doi.org/10.7567/SSDM.1986.A-10-2