[A-3-7] Selective Epitaxial Growth of Si and in Situ Deposition of Amorphous- or Poly-Si for Recrystallisation Purposes L. KARAPIPERIS、G. GARRY、D. DIEUMEGARD (1.Laboratoire Central de Recherches, THOMSON-CSF) https://doi.org/10.7567/SSDM.1986.A-3-7
