The Japan Society of Applied Physics

[A-5-2] Photochemical Vapor Deposition of Single-Crystal Silicon at a Very Low Temperature of 200℃

A. Yamada, S. Nishida, M. Konagai, K. Takahashi (1.Department of Physical Electronics, Tokyo Institute of Technology)

https://doi.org/10.7567/SSDM.1986.A-5-2