[A-6-3] Depth Profiling of Silicon Nitride Films Prepared by Plasma Anodization

H. Zama, M. Hara, T. Suzuki, T. Hattori M. Hirayama, T. Matsukawa (1.Department of Electrical and Electronic Engineering Musashi Institute of Technology, 2.LSI Research and Development Laboratory Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1986.A-6-3