[C-11-5] Deep Level Characterization for Aluminum Doped ZnSe Grown by MOCVD

A. Kamata, Y. Zohta, M. Kawachi, T. Sato, M. Okajima, K. Hirahara, T. Beppu (1.Toshiba R&D Center, Toshiba Corporation)

https://doi.org/10.7567/SSDM.1986.C-11-5