The Japan Society of Applied Physics

[C-3-3] Formation of Buried Isolation Layer by Implanting Focused B Ion Beam in GaAs Multilayer Using FIBI-MBE System

Hiroshi Arimoto、Tetsuo Morita、Akira Takamori、Yasuo Bamba、Eizo Miyauchi、Hisao Hashimoto (1.Optoelectronics Joint Research Laboratory)

https://doi.org/10.7567/SSDM.1986.C-3-3