[D-6-3] Highly Uniform Growth of AlGaAs/GaAs Hetero- Epitaxial Wafer for Solar Cell Application by Large-Capacity MOCVD Reactor

N. Hayafuji、S. Ochi、M. Kato、K. Mizuguchi、K. Mitsui、T. Murotani、Y. Yukimoto (1.LSI R&D Laboratory, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1986.D-6-3