The Japan Society of Applied Physics

[D-6-3] Highly Uniform Growth of AlGaAs/GaAs Hetero- Epitaxial Wafer for Solar Cell Application by Large-Capacity MOCVD Reactor

N. Hayafuji, S. Ochi, M. Kato, K. Mizuguchi, K. Mitsui, T. Murotani, Y. Yukimoto (1.LSI R&D Laboratory, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1986.D-6-3