[C-3-2] Electron Spin Resonance Study of a New Positively Charged Defect in Device Oxides Damaged by Soft X-Rays

B. B. Triplett, T. Takahashi, K. Yokogawa, T. Sugano (1.Dept. of Electronic Engineering, University of Tokyo, 2.Intel Researcher in Residence, 3.Nippon Steel Corporation)

https://doi.org/10.7567/SSDM.1987.C-3-2