[C-3-4] Through-Oxide Cleaning of Silicon Surface by Photo-Excited Radicals

Rinshi Sugino、Yasuo Nara、Tatsuya Yamazaki、Satoru Watanabe、Takashi Ito (1.FUJITSU LABORATORIES LTD., Atsugi)

https://doi.org/10.7567/SSDM.1987.C-3-4