[C-4-5] Formation of High Quality Epitaxial Silicon Films by Ultra Clean Technology

Tadahiro Ohmi, Shigeru Kuromiya, Syunji Yoshitake, Hiroshi Iwabuchi, Genichi Sato, Junichi Murota (1.Faculty of Engineering, Tohoku University, 2.Research Institute of Electrical Communication, Tohoku University)

https://doi.org/10.7567/SSDM.1987.C-4-5