[C-4-5] Formation of High Quality Epitaxial Silicon Films by Ultra Clean Technology

Tadahiro Ohmi、Shigeru Kuromiya、Syunji Yoshitake、Hiroshi Iwabuchi、Genichi Sato、Junichi Murota (1.Faculty of Engineering, Tohoku University、2.Research Institute of Electrical Communication, Tohoku University)

https://doi.org/10.7567/SSDM.1987.C-4-5