[C-7-2] 0.25μm Pattern Formation by Variably Shaped EB Exposure System EX-7

K. Hattori、S. Tamamushi、H. Wada、H. Kusakabe、I. Sasaki、T. Abe、K. Koyama、O. Ikenaga、K. Ohta、R. Yoshikawa、T. Takigawa (1.VLSI Research Center, Toshiba Corporation)

https://doi.org/10.7567/SSDM.1987.C-7-2