0.25μm Pattern Formation by Variably Shaped EB Exposure System EX-7

K. Hattori; S. Tamamushi; H. Wada; H. Kusakabe; I. Sasaki; T. Abe; K. Koyama; O. Ikenaga; K. Ohta; R. Yoshikawa; T. Takigawa

doi:https://doi.org/10.7567/SSDM.1987.C-7-2

[C-7-2] 0.25μm Pattern Formation by Variably Shaped EB Exposure System EX-7

K. Hattori, S. Tamamushi, H. Wada, H. Kusakabe, I. Sasaki, T. Abe, K. Koyama, O. Ikenaga, K. Ohta, R. Yoshikawa, T. Takigawa (1.VLSI Research Center, Toshiba Corporation)

https://doi.org/10.7567/SSDM.1987.C-7-2

1987 Conference on Solid State Devices and Materials

[C-7-2] 0.25μm Pattern Formation by Variably Shaped EB Exposure System EX-7