[C-7-4] Two-Dimensional Monte Carlo Simulation of Damage Distribution Induced by Ion Implantation into Submicron Silicon Areas

Shoji Shukuri、Tohru Ishitani、Masao Tamura、Yasuo Wada (1.Central Research Laboratory, Hitachi, Ltd.)

https://doi.org/10.7567/SSDM.1987.C-7-4