Plasma Doping into the Side-Wall of a Sub-0.5μm Width Trench

Bunji MlZUNO; Ichiroh NAKAYAMA; Nobuo AOI; Masafumi KUBOTA

doi:https://doi.org/10.7567/SSDM.1987.C-8-4

[C-8-4] Plasma Doping into the Side-Wall of a Sub-0.5μm Width Trench

Bunji MlZUNO, Ichiroh NAKAYAMA, Nobuo AOI, Masafumi KUBOTA (1.Semiconductor Research Center, 2.Production Engineering Laboratory, Matsushita Electric Industrial Co., Ltd.)

https://doi.org/10.7567/SSDM.1987.C-8-4

1987 Conference on Solid State Devices and Materials

[C-8-4] Plasma Doping into the Side-Wall of a Sub-0.5μm Width Trench