[S-II-13] Liquid Phase Oxidation Employing O Atoms Produced by Microwave Discharge and Si(CH3)4

S. Noguchi, H. Okano, Y. Horiike (1.Heavy Apparatus Engineering Laboratory, Toshiba Corp., 2.VLSI Research Center, Toshiba Corp.)

https://doi.org/10.7567/SSDM.1987.S-II-13