[A-1-4] Thermal Stability Studies on Copper Thin Films Formed by a Low-Kinetic-Energy Particle Process

Tatsuyiki Saito、Tadahiro Ohmi、Tadashi Shibata、Masahito Otsuki、Takahisa Nitta (1.Department of Electronics, Faculty of Engineering Tohoku University、2.Device Development Center, Hitachi Ltd.)

https://doi.org/10.7567/SSDM.1989.A-1-4