[A-2-1] Epitaxial Growth of Al(100) on Si(100) by Gas-Temperature-Controlled Chemical Vapor Deposition

Atsushi SEKIGUCHI、Tsukasa KOBAYASHI、Naokichi HOSOKAWA、Tatsuo ASAMAKI (1.ANELVA Corporation)

https://doi.org/10.7567/SSDM.1989.A-2-1