[A-3-3] Atomic Layer Growth of Silicon by Excimer Laser Induced Cryogenic CVD

T. TANAKA、T. FUKUDA、Y. NAGASAWA、S. MIYAZAKI、M. HIROSE (1.Department of Electrical Engineering, Hiroshima University)

https://doi.org/10.7567/SSDM.1989.A-3-3