[A-3-3] Atomic Layer Growth of Silicon by Excimer Laser Induced Cryogenic CVD

T. TANAKA, T. FUKUDA, Y. NAGASAWA, S. MIYAZAKI, M. HIROSE (1.Department of Electrical Engineering, Hiroshima University)

https://doi.org/10.7567/SSDM.1989.A-3-3