[A-4-2] Highly Stable Fluorinated Plasma CVD Silicon Nitride Film by SiH4 Addition for ULSI Passivation

K. Shimokawa、M. Yoshimaru、H. Matsui (1.VLSI R&D Center, Oki Electric Industry Co., Ltd.)

https://doi.org/10.7567/SSDM.1989.A-4-2