[B-1-1] Perfect-Selectivity Directional Etching of Silicon Using Ultraclean ECR Plasma

Takashi MATSUURA、Hiroaki UETAKE、Junichi MUROTA、Kouichi FUKUDA、Tadahiro OHMI、Nobuo MIKOSHIBA、Tadashi KAWASHIMA、Yoshihiro YAMASHITA (1.Department of Electronics, Faculty of Engineering, Tohoku University、2.Research Institute of Electrical Communication, Tohoku University、3.Takatsuka Units, Seiko Instruments Inc.)

https://doi.org/10.7567/SSDM.1989.B-1-1