[B-1-2] Microwave Plasma Etching of Silicon Dioxide for Half-Micron ULSIs
Kazuo NOJIRI, Eri IGUCHI, Koichiro KAWAMURA, Kazuya KADOTA
(1.Semiconductor Design & Development Center, Hitachi Ltd., 2.Hitachi Microcomputer Engineering, Ltd.)
https://doi.org/10.7567/SSDM.1989.B-1-2
