Microwave Plasma Etching of Silicon Dioxide for Half-Micron ULSIs

Kazuo NOJIRI; Eri IGUCHI; Koichiro KAWAMURA; Kazuya KADOTA

doi:https://doi.org/10.7567/SSDM.1989.B-1-2

1989 Conference on Solid State Devices and Materials

1989年8月28日〜 1989年8月30日
Nippon Toshi Center, Tokyo, Japan

[B-1-2] Microwave Plasma Etching of Silicon Dioxide for Half-Micron ULSIs

Kazuo NOJIRI、Eri IGUCHI、Koichiro KAWAMURA、Kazuya KADOTA (1.Semiconductor Design & Development Center, Hitachi Ltd.、2.Hitachi Microcomputer Engineering, Ltd.)

https://doi.org/10.7567/SSDM.1989.B-1-2

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