A Composite lon-Implantation/Dopant Diffusion Simulation Involving Point Defect Kinetics and Its Application to Ultra Shallow Base Design

[B-2-2] A Composite lon-Implantation/Dopant Diffusion Simulation Involving Point Defect Kinetics and Its Application to Ultra Shallow Base Design

Takako K. OKADA, Koichi KATO (1.ULSI Research Center, Toshiba Corporation, 2.Research and Development Center, Toshiba Corporation)