[B-2-5] Reduction of Thickness Secondary Defects in MeV Ion Implanted Silicon by Intrinsic Gettering

N. Shimizu, B. Mizuno, S. Akiyama, K. Tsuji, T. Ohzone (1.Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.)

https://doi.org/10.7567/SSDM.1989.B-2-5