[B-2-5] Reduction of Thickness Secondary Defects in MeV Ion Implanted Silicon by Intrinsic Gettering

N. Shimizu、B. Mizuno、S. Akiyama、K. Tsuji、T. Ohzone (1.Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.)

https://doi.org/10.7567/SSDM.1989.B-2-5