[C-3-2] Improvement of Fluoride/GaAs Interfaces by Rapid Thermal Annealing and Its Application to MISFET Fabrications

Kwang Ho KIM、Hiroshi ISHIWARA、Seijiro FURUKAWA (1.Research Laboratory of Precision Mechinery and Electronics、2.Graduate School of Science and Engineering, Tokyo Institute of Technolgy)

https://doi.org/10.7567/SSDM.1989.C-3-2