[S-B-3] In-Depth Profiling of Suboxide Compositions in the SiO2/Si Interface by Angle Resolved X-ray Photoelectron Spectroscopy

Masaru TAKAKURA, Takeshi SUNADA, Seiichi MIYAZAKI, Masataka HIROSE (1.Department of Electrical Engineering, Hiroshima University)

https://doi.org/10.7567/SSDM.1989.S-B-3