[S-B-4] Native Oxides Formed During Wet Chemical Treatments

K. Takase、T. Igarashi、N. Miyata、K. Moriki、R. Sugino、Y. Nara、T. Ito、M. Fujisawa、T. Hattori (1.Department of Electrical and Electronic Engineering, Musashi Institute of Technology、2.Fujitsu Laboratories Ltd., Atsugi、3.The Institute of Solid State Physics, The University of Tokyo)

https://doi.org/10.7567/SSDM.1989.S-B-4