[C-10-4] The Chemical Bonding Features of Fluorine and Boron in BF2+ Ion Implanted Si

T. Kinoshita、M. Takakura、S. Miyazaki、S. Yokoyama、M. Koyanagi、M. Hirose (1.Department of Electrical Engineering, Hiroshima University、2.Research Center for Integrated Systems, Hiroshima University)

https://doi.org/10.7567/SSDM.1990.C-10-4