[C-2-1] Highly Reliable Thin Nitrided SiO2 Films Formed by Rapid Thermal Processing in an N2O Ambient

Hisashi FUKUDA、Tomiyuki ARAKAWA、Seigo OHNO (1.Semiconductor Tech. Lab.、2.Oki Electric Industry Co., Ltd)

https://doi.org/10.7567/SSDM.1990.C-2-1