[C-2-4] Optimization of Nitridation and Re-oxidation Conditions for an EEPROM Tunneling Dielectric

N. Ajika、M. Ohi、O. Sakamoto、H. Arima、T. Matsukawa、N. Tsubouchi (1.LSI Research and Development Laboratory Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1990.C-2-4